真空/压力系统
Our vacuum and pressure probe stations for on-wafer measurements in a high vacuum or controlled pressure environment enable precise µ-bolometer test (un-cooled IR-FPA), MEMS characterization (inertial MEMS, resonators and RF MEMS, pressure sensors), IV/CV, RF/mmW and Opto measurements. Multiple optical instruments like IR radiation sources (black bodies), and up to eight probe positioners and/or a probe card can be integrated. The high stability design provides excellent contact quality and accurate measurement results in a condensation-free test environment. Step and repeat capability enables high throughput with our semi-automated systems.
